Ligand exchange reactions in InGaAs metalorganic vapor-phase epitaxy

被引:7
|
作者
Kappers, MJ [1 ]
Warddrip, ML [1 ]
Hicks, RF [1 ]
机构
[1] Univ Calif Los Angeles, Dept Chem Engn, Los Angeles, CA 90095 USA
基金
美国国家科学基金会;
关键词
ligand exchange; metalorganic vapor-phase epitaxy; infrared spectroscopy; InGaAs;
D O I
10.1016/S0022-0248(98)00174-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Metalorganic vapor-phase epitaxy of InyGa1-yAs from triethylgallium, trimethylindium and tertiarybutylarsine was studied using on-line infrared spectroscopy to monitor the organometallic compounds in the feed and effluent gases. The film composition was measured by X-ray diffraction. Ligand exchange reactions between the group III sources were found to occur in the feed lines. The new species produced were trimethylgallium, dimethylethylgallium, methyldiethylgallium, dimethylethylindium and methyldiethylindium. The thermal stability of these species varied over a wide temperature range. For example, the ethylindium compounds started to decompose at 250 degrees C, while trimethylgallium began to react at 500 degrees C. In the square-duct reactor used in this study, the wide variation in the reactivity of the precursors resulted in films that were indium rich near the reactor inlet and gallium rich near the reactor outlet. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:332 / 340
页数:9
相关论文
共 50 条
  • [1] Ligand exchange reactions in organometallic vapor phase epitaxy
    Kappers, MJ
    Warddrip, ML
    Wilkerson, KJ
    Hicks, RF
    JOURNAL OF ELECTRONIC MATERIALS, 1997, 26 (10) : 1169 - 1173
  • [2] Phase control of GaN on Si by nanoscale faceting in metalorganic vapor-phase epitaxy
    Lee, SC
    Sun, XY
    Hersee, SD
    Brueck, SRJ
    JOURNAL OF CRYSTAL GROWTH, 2004, 272 (1-4) : 2 - 8
  • [3] Metalorganic vapor-phase epitaxy of III/V phosphides with tertiarybutylphosphine and tertiarybutylarsine
    Chen, GY
    Cheng, D
    Hicks, RF
    Noori, AM
    Hayashi, SL
    Goorsky, MS
    Kanjolia, R
    Odedra, R
    JOURNAL OF CRYSTAL GROWTH, 2004, 270 (3-4) : 322 - 328
  • [4] Metalorganic vapor-phase epitaxy of room-temperature, low-threshold InGaAs/AlInAs quantum cascade lasers
    Bour, D
    Troccoli, M
    Capasso, F
    Corzine, S
    Tandon, A
    Mars, D
    Höfler, G
    JOURNAL OF CRYSTAL GROWTH, 2004, 272 (1-4) : 526 - 530
  • [5] Growth of InGaAs nanowires by selective-area metalorganic vapor phase epitaxy
    Sato, Takuya
    Motohisa, Junichi
    Noborisaka, Jinichiro
    Hara, Shinjiro
    Fukui, Takashi
    JOURNAL OF CRYSTAL GROWTH, 2008, 310 (7-9) : 2359 - 2364
  • [6] IN-SITU X-RAY MONITORING OF METALORGANIC VAPOR-PHASE EPITAXY
    TSUCHIYA, T
    TANIWATARI, T
    UOMI, K
    KAWANO, T
    ONO, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (10): : 4652 - 4655
  • [7] METALORGANIC VAPOR-PHASE EPITAXY OF ZNSE USING TERTIARYBUTYLSELENOL AS SELENIUM SOURCE PRECURSOR
    NISHIMURA, K
    NAGAO, Y
    SAKAI, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1993, 32 (3B): : L428 - L430
  • [8] CDZNSE-ZNSE MULTILAYERS BY METALORGANIC VAPOR-PHASE EPITAXY USING DIMETHYLSELENIDE
    PARBROOK, PJ
    KAMATA, A
    UEMOTO, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (1B): : 669 - 673
  • [9] Gallium arsenide and indium arsenide surfaces produced by metalorganic vapor-phase epitaxy
    Li, L
    Han, BK
    Law, D
    Begarney, M
    Hicks, RF
    JOURNAL OF CRYSTAL GROWTH, 1998, 195 (1-4) : 28 - 33
  • [10] ALGAAS/GAAS AND ALGAAS/INGAAS/GAAS HIGH ELECTRON-MOBILITY TRANSISTORS GROWN BY METALORGANIC VAPOR-PHASE EPITAXY USING TERTIARYBUTYLARSINE
    KIKKAWA, T
    OHORI, T
    MITANI, E
    SUZUKI, M
    TANAKA, H
    KOMENO, J
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1991, 30 (10A): : L1718 - L1721