Effects of D-Phenylalanine as a biocide enhancer of THPS against the microbiologically influenced corrosion of C1018 carbon steel

被引:57
作者
Xu, Jin [1 ,2 ]
Jia, Ru [1 ]
Yang, Dongqing [1 ]
Sun, Cheng [2 ]
Gu, Tingyue [1 ]
机构
[1] Ohio Univ, Dept Chem & Biomol Engn, Inst Corros & Multiphase Technol, Athens, OH 45701 USA
[2] Chinese Acad Sci, Inst Met Res, Environm Corros Ctr, Shenyang 110016, Liaoning, Peoples R China
基金
中国国家自然科学基金;
关键词
D-amino acid; THPS; SRB; Corrosion; Biofilm; SULFATE-REDUCING BACTERIA; D-AMINO ACIDS; DESULFOVIBRIO-VULGARIS BIOFILM; STAINLESS-STEEL; BEHAVIOR; MITIGATION; SULFIDE; PASSIVATION; H2S;
D O I
10.1016/j.jmst.2018.09.011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Microbiologically influenced corrosion (MIC) is caused by biofilms such as those of sulfate reducing bacteria (SRB). To mitigate MIC, biocide treatment is often needed. Tetrakis (hydroxymethyl) phosphonium sulfate (THPS) is an environmentally friendly biocide that is often used in the oil and gas industry. However, its prolonged use leads to biocide resistance, leading to dosage escalation. A biocide enhancer can be used to slow down the trend. In recent years, D-amino acids have been investigated as an enhancer for THPS and other biocides. Published works used anaerobic vials and flow devices, which could not reveal the real-time changes of the biocide treatment on corrosion. In this work, it was proven that the biocide enhancement effects of D-Phenylalanine (D-Phe) on THPS against the Desulfovibrio vulgaris biofilm on C1018 carbon steels could be assessed in real time using linear polarization resistance and electrochemical impedance spectroscopy to collaborate sessile cell count, weight loss and pitting depth data. The results showed that 500 ppm (w/w) D-Phe effectively enhanced 80 ppm THPS against MIC by the D. vulgaris (a corrosive SRB) biofilm. The sessile cell count and pit depth were all reduced with the enhancement of D-Phe. (C) 2018 Published by Elsevier Ltd on behalf of The editorial office of Journal of Materials Science & Technology.
引用
收藏
页码:109 / 117
页数:9
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