In situ RHEED control of self-organized Ge quantum dots

被引:42
作者
Nikiforov, AI [1 ]
Cherepanov, VA [1 ]
Pchelyakov, OP [1 ]
Dvurechenskii, AV [1 ]
Yakimov, AI [1 ]
机构
[1] Russian Acad Sci, Inst Semicond Phys, Siberian Branch, Novosibirsk 630090, Russia
基金
俄罗斯基础研究基金会;
关键词
GeSi; MBE; quantum dot; RHEED;
D O I
10.1016/S0040-6090(00)01493-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In situ registration of high-energy electron diffraction patterns was used for constructing the diagram of structural and morphological states of the Gz film on the Si(100) surface. The following regions identified in the diagram: two-dimensional (2D)-growth, 'hut'- and 'dome'-clusters, 'dome'-clusters with misfit dislocations at the interface. Variations in the lattice constants of the Ge film during, the MBE growth on the: Si(100) surface were determined. An increase in the lattice constant at the (100) surface was attributed to the elastic deformation at the stage of 2D growth and formation of 'hut'-clusters and to the plastic relaxation for the 'dome'-clusters. As a result, epitaxial silicon structures with germanium quantum dots of 15 nm base size at the density of 3 x 10(11) cm(-2) were synthesized. The total electron structure of the hole spectrum of Ge quantum dots in Si was established. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:158 / 163
页数:6
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