Line tension approaching a first-order wetting transition: Experimental results from contact angle measurements

被引:114
作者
Wang, JY [1 ]
Betelu, S [1 ]
Law, BM [1 ]
机构
[1] Kansas State Univ, Dept Phys, Condensed Matter Lab, Manhattan, KS 66506 USA
来源
PHYSICAL REVIEW E | 2001年 / 63卷 / 03期
关键词
D O I
10.1103/PhysRevE.63.031601
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The line tension values of n-octane and 1-octene on a hexadecyltrichlorosilane coated silicon wafer, are determined by contact angle measurements at temperatures near a first-order wetting transition T-w. It is shown experimentally that the line tension changes sign as the temperature increases toward T-w in agreement with a number of theoretical predictions. A simple phenomenological model possessing a repulsive barrier at l(0) = 5.1 +/- 0.2 nm and a scale factor of B = 78 +/- 6 provides a quantitative description of the experiments.
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页码:031601 / 031601
页数:11
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