Helium behavior in UO2 polycrystalline disks

被引:25
|
作者
Guilbert, S [1 ]
Sauvage, T
Erramli, H
Barthe, MF
Desgardin, P
Blondiaux, G
Corbel, C
Piron, JP
机构
[1] Ctr Etud & Rech Irradiat, F-45071 Orleans, France
[2] Univ Cadi Ayyad, Fac Sci Semlalia, Nucl Phys & Tech Lab, Marrakech, Morocco
[3] CEA Saclay, Lab Radiolyse, F-91191 Gif Sur Yvette, France
[4] CEA Cadarache, SESC, DEC, DEN, F-13108 St Paul Les Durance, France
关键词
D O I
10.1016/S0022-3115(03)00212-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The behavior of helium implanted in sintered uranium dioxide disks has been investigated as a function of annealing temperature. UO2 disks have been implanted with 1 MeV He-3 at a nominal fluence of 5 x 10(16) He-3 cm(-2) using a Van de Graaff accelerator. The He-3(d,alpha)H-1 nuclear reaction analysis method was used to determine the helium depth profile in the UO2 disks. Partial flaking was observed after annealing at 500 degreesC for local He concentration of 1 at.%. After annealing at 600 degreesC flaking has affected the whole surface. The formation of helium bubbles is discussed. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:121 / 128
页数:8
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