Surface functionalization of PEEK films studied by time-of-flight secondary ion mass spectrometry and x-ray photoelectron spectroscopy

被引:0
|
作者
Henneuse-Boxus, C
Poleunis, C
De Ro, A
Adriaensen, Y
Bertrand, P
Marchand-Brynaert, J
机构
[1] Catholic Univ Louvain, Lab Chim Organ Synth, B-1348 Louvain, Belgium
[2] Catholic Univ Louvain, Lab Physicochim & Phys Mat, B-3000 Louvain, Belgium
[3] Catholic Univ Louvain, Lab Chim Interfaces, Louvain, Belgium
关键词
poly(aryl ether ether ketone); PEEK film; surface wet chemistry; x-ray photoelectron spectroscopy (XPS); secondary ion mass spectrometry (SIMS;
D O I
10.1002/(SICI)1096-9918(199903)27:3<142::AID-SIA493>3.0.CO;2-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Using the wet chemistry method, the surface of poly(aryl ether ether ketone) (PEEK) him aas selectively modified to produce PEEE-OH, PEEE-COOH, PEEK-glutamine, PEEK-NH2 and PEEK-SO3H samples displaying, respectively hydroxyl, carboxyl, amino acid, amine and sulphonyl functions. All the samples were analysed by XPS and time-of-flight (ToF) SIMS; the experimental data provided by both techniques were in good agreement, and allowed the chemical nature and the yield of the functional groups introduced by the different surface derivatizations to be determined. Copyright (C) 1999 John Wiley & Sons, Ltd.
引用
收藏
页码:142 / 152
页数:11
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