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Highly active and stable alumina supported nickel nanoparticle catalysts for dry reforming of methane
被引:170
作者:
Shang, Zeyu
[1
]
Li, Shiguang
[2
]
Li, Ling
[3
]
Liu, Guozhu
[3
]
Liang, Xinhua
[1
]
机构:
[1] Missouri Univ Sci & Technol, Dept Chem & Biochem Engn, Rolla, MO 65409 USA
[2] Inst Gas Technol, 1700 S Mt Prospect Rd, Des Plaines, IL 60018 USA
[3] Tianjin Univ, Sch Chem Engn & Technol, Minist Educ, Key Lab Green Chem Technol, Tianjin 300072, Peoples R China
关键词:
Atomic layer deposition (ALD);
Ni nanoparticle;
Supported catalyst;
NiAl2O4;
spinel;
Dry reforming of methane (DRM);
ATOMIC LAYER DEPOSITION;
SYNTHESIS GAS-PRODUCTION;
TO-LIQUIDS GTL;
NI CATALYSTS;
CARBON-DIOXIDE;
NI/AL2O3;
CATALYSTS;
CO2;
CONVERSION;
PARTICLES;
STABILITY;
D O I:
10.1016/j.apcatb.2016.08.019
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
A highly stable and extremely active nickel (Ni) nanoparticle catalyst, supported on porous gamma-Al2O3 particles, was prepared by atomic layer deposition (ALD). The catalyst was employed to catalyze the reaction of dry reforming of methane (DRM). The catalyst initially gave a low conversion at 850 degrees C, but the conversion increased with an increase in reaction time, and stabilized at 93% (1730 L h(-1) g (-1)(Ni) at 850 degrees C). After regeneration, the catalyst showed a very high methane reforming rate (1840 L h(-1) g (-1)(Ni) at 850 degrees C). The activated catalyst showed exceptionally high catalytic activity and excellent stability of DRM reaction in over 300 h at temperatures that ranged from 700 degrees C to 850 degrees C. The excellent stability of the catalyst resulted from the formation of NiAl2O4 spinel. The high catalytic activity was due to the high dispersion of Ni nanoparticles deposited by ALD and the reduction of NiAl2O4 spinel to Ni during the DRM reaction at 850 degrees C. It was verified that NiAl2O4 can be reduced to Ni in a reductive gas mixture (i.e., carbon monoxide and hydrogen) during the reaction at 850 degrees C, but not by H-2 alone. (C) 2016 Elsevier B.V. All rights reserved.
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页码:302 / 309
页数:8
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