Ripple topography on thin ZnO films by grazing and oblique incidence ion sputtering

被引：10

作者：

Bhattacharjee, S. ^{[2
]}

Karmakar, P. ^{[1
]}

Sinha, A. K. ^{[2
]}

Charkrabarti, A. ^{[1
]}

机构：

[1] Ctr Variable Energy Cyclotron, Kolkata 700064, India

[2] UGC DAE CSR, Kolkata Ctr, Kolkata 700098, India

来源：

APPLIED SURFACE SCIENCE | 2011年 / 257卷 / 15期

关键词：

Sputtering; Ripple; Grazing incidence; ZnO; BOMBARDED SI(001); PATTERN-FORMATION; EVOLUTION; SURFACES; EROSION;

D O I：

10.1016/j.apsusc.2011.02.123

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have investigated the formation and growth of nano sized ripple topography on ZnO thin films by 10 keV O1+ bombardment at impact angles of 80 degrees and 60 degrees, varying the ion fluence from 5 x 10(16) to 1 x 10(18) ions/cm(2). At 80 degrees the ripples are oriented along the ion beam direction whereas at 60 degrees it is perpendicular to the ion beam direction. The developed ion induced structures are characterized by atomic force microscopy (AFM) and the alignment, variation of rms roughness, wavelength and correlation length of the structures are discussed with the existing model and basic concept of ion surface interaction. (C) 2011 Elsevier B. V. All rights reserved.

引用

收藏

页码：6775 / 6778

页数：4

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