Fabrication and applications of subwavelength gratings

被引:0
|
作者
Toyota, H [1 ]
Yu, W [1 ]
Okano, M [1 ]
Omori, S [1 ]
Yotsuya, T [1 ]
Kikuta, H [1 ]
Ichioka, Y [1 ]
机构
[1] Osaka Sci & Technol Ctr, Izumi, Osaka 5941157, Japan
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中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We have developed several kinds of diffractive optical elements with submicron structures. This paper describes the optical elements, such as antireflection structured surface, a high efficiency computer generated hologram, blazed grating with subwavelength structure and so on. A key technology of fabrication of them is a high-density plasma etching. The profiles of subwavelength structures are controlled by etching conditions. (c) 2002 Optical Society of America.
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页码:235 / 237
页数:3
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