Multifunctional silicon-based light emitting device in standard complementary metal-oxide-semiconductor technology

被引:5
|
作者
Wang Wei [1 ]
Huang Bei-Ju [1 ]
Dong Zan [1 ]
Chen Hong-Da [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
基金
中国国家自然科学基金; 国家高技术研究发展计划(863计划);
关键词
optoelectronic integrated circuit; complementary metal-oxide-semiconductor technology; silicon-based light emitting device; electroluminescence; PHOTON-EMISSION; ELECTROLUMINESCENCE; EFFICIENCY; BREAKDOWN; DIODES; MODEL; LEDS;
D O I
10.1088/1674-1056/20/1/018503
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A three-terminal silicon-based light emitting device is proposed and fabricated in standard 0.35 mu m complementary metal-oxide-semiconductor technology. This device is capable of versatile working modes: it can emit visible to near infra-red (NIR) light (the spectrum ranges from 500 nm to 1000 nm) in reverse bias avalanche breakdown mode with working voltage between 8.35 V-12 V and emit NIR light (the spectrum ranges from 900 nm to 1300 nm) in the forward injection mode with working voltage below 2 V. An apparent modulation effect on the light intensity from the polysilicon gate is observed in the forward injection mode. Furthermore, when the gate oxide is broken down, NIR light is emitted from the polysilicon/oxide/silicon structure. Optoelectronic characteristics of the device working in different modes are measured and compared. The mechanisms behind these different emissions are explored.
引用
收藏
页数:7
相关论文
共 50 条
  • [31] Cross-sectional scanning tunneling spectroscopy of cleaved, silicon-based metal-oxide-semiconductor junctions
    Univ of Pennsylvania, Philadelphia, United States
    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 1996, 14 (03): : 1607 - 1610
  • [32] Ferromagnetic Resonance Spin Pumping and Electrical Spin Injection in Silicon-Based Metal-Oxide-Semiconductor Heterostructures
    Pu, Y.
    Odenthal, P. M.
    Adur, R.
    Beardsley, J.
    Swartz, A. G.
    Pelekhov, D. V.
    Flatte, M. E.
    Kawakami, R. K.
    Pelz, J.
    Hammel, P. C.
    Johnston-Halperin, E.
    PHYSICAL REVIEW LETTERS, 2015, 115 (24)
  • [33] Cross-sectional scanning tunneling spectroscopy of cleaved, silicon-based metal-oxide-semiconductor junctions
    Thibado, PM
    Mercer, TW
    Fu, S
    Egami, T
    DiNardo, NJ
    Bonnell, DA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03): : 1607 - 1610
  • [34] FABRICATION OF MICROBRIDGES IN STANDARD COMPLEMENTARY METAL-OXIDE SEMICONDUCTOR TECHNOLOGY
    PARAMESWARAN, M
    RISTIC, L
    DHADED, AC
    BALTES, HP
    ALLEGRETTO, W
    ROBINSON, AM
    CANADIAN JOURNAL OF PHYSICS, 1989, 67 (04) : 184 - 189
  • [35] Polarization-Independent Photodetectors With Enhanced Responsivity in a Standard Silicon-on-Insulator Complementary Metal-Oxide-Semiconductor Process
    Moll, N.
    Morf, T.
    Fertig, M.
    Stoeferle, T.
    Trauter, B.
    Mahrt, R. F.
    Weiss, J.
    Pflueger, T.
    Brenner, K. -H.
    JOURNAL OF LIGHTWAVE TECHNOLOGY, 2009, 27 (21) : 4892 - 4896
  • [36] Mitigation of Complementary Metal-Oxide-Semiconductor Variability with Metal Gate Metal-Oxide-Semiconductor Field-Effect Transistors
    Yang, Ji-Woon
    Park, Chang Seo
    Smith, Casey E.
    Adhikari, Hemant
    Huang, Jeff
    Heh, Dawei
    Majhi, Prashant
    Jammy, Raj
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (04)
  • [37] A Germanium Based Quantum Well Complementary Metal-Oxide-Semiconductor Transistor
    Li, Yucheng
    Zhang, Shiqi
    Song, Jianjun
    JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, 2022, 17 (09) : 1245 - 1255
  • [38] Hybrid complementary metal-oxide-semiconductor inverters based on single nanowires
    Dai, Yu
    Wu, Peicai
    Dai, Lun
    Fang, Xiaolong
    Qin, Guogang
    JOURNAL OF MATERIALS CHEMISTRY, 2011, 21 (09) : 2858 - 2862
  • [39] Injection-avalanche-based n+pn silicon complementary metal-oxide-semiconductor light-emitting device (450-750nm) with 2-order-of-magnitude increase in light emission intensity
    Snyman, Lukas W.
    Du Plessis, Monuko
    Aharoni, Herzl
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (4B): : 2474 - 2480
  • [40] SILICON-WAFER ORIENTATION DEPENDENCE OF METAL-OXIDE-SEMICONDUCTOR DEVICE RELIABILITY
    NAKAMURA, K
    OHMI, K
    YAMAMOTO, K
    MAKIHARA, K
    OHMI, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (1B): : 500 - 504