IN-SITU X-RAY REFLECTIVITY MEASUREMENT OF THIN FILM GROWTH

被引：0
|
作者：
Lee, Chih-Hao [1 ]
Tseng, Sung-Yuh [1 ]
机构：
[1] Natl Tsing Hua Univ, Dept Nucl Engn & Engn Phys, Hsinchu 30043, Taiwan
来源：
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 1996年 / 52卷
关键词：
D O I：
10.1107/S0108767396080609
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
PS12.03.09
引用
收藏
页码：C473 / C473
页数：1
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