Characterization of deposited materials formed by focused ion beam-induced chemical vapor deposition using an AuSi alloyed metal source

被引：0
|
作者：
Yo, T. [1 ]
Tanaka, H. [1 ]
Koreyama, K. [1 ]
Nagata, T. [2 ,3 ]
Sakuma, Y. [2 ]
Nakajima, K. [2 ]
Chikyow, T. [2 ,3 ]
Yanagisawa, J. [1 ,3 ,4 ]
Sakai, A. [1 ]
机构：
[1] Osaka Univ, Grad Sch Engn Sci, Toyonaka, Osaka 5608531, Japan
[2] Natl Inst Mat Sci, Adv Elect Mat Ctr, Tsukuba, Ibaraki 3050044, Japan
[3] CREST JST, Kawaguchi, Saitama 3320012, Japan
[4] Osaka Univ, CQST, Toyonaka, Osaka 5608531, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS | 2007年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：150 / +
页数：2
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