Surface-chemistry-sensitive spectral features of In-Ga-Zn-O thin film: Cleaned, air-passivated, and sputter-phase-separated surfaces

被引:11
作者
Kang, Se Jun [2 ]
Baik, Jae Yoon [1 ]
Thakur, Anup [1 ]
Kim, Hyeong-Do [1 ]
Shin, Hyun-Joon [1 ,2 ]
Chung, JaeGwan [3 ]
Lee, Jaecheol [3 ]
Lee, JaeHak [3 ]
机构
[1] Pohang Univ Sci & Technol, Pohang Accelerator Lab, Pohang 790784, South Korea
[2] Pohang Univ Sci & Technol, Dept Phys, Pohang 790784, South Korea
[3] Samsung Adv Inst Technol, A E Grp, Yongin 449712, Gyeinggi Do, South Korea
关键词
AMORPHOUS OXIDE SEMICONDUCTORS; ELECTRONIC-STRUCTURE; SUBGAP; STATES;
D O I
10.1016/j.cplett.2011.05.050
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The photoelectron spectral features and corresponding energy band diagrams of amorphous indium gallium zinc oxide (a-IGZO) thin films were investigated for different surface chemistries. Cleaned-IGZO surface had a deep subgap state (DSS), the binding energy (BE) of which expanded to similar to 1.5 eV. When stored in air, IGZO surface became contaminant passivated and DSS became negligible. Sputtering resulted in phase separation of surface into metallic In and lesser In and Zn containing IGZO. Compared with IGZO, the air-passivated surface and phase-separated surface, respectively, had a more weakly conducting environment and a higher BE spectral shift. (C) 2011 Elsevier B. V. All rights reserved.
引用
收藏
页码:234 / 236
页数:3
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