High-resolution imaging of contact potential difference with ultrahigh vacuum noncontact atomic force microscope

被引：251
|
作者：
Kitamura, S [1 ]
Iwatsuki, M [1 ]
机构：
[1] Jeol Ltd, Akishima, Tokyo 196, Japan
来源：
APPLIED PHYSICS LETTERS | 1998年 / 72卷 / 24期
关键词：
D O I：
10.1063/1.121577
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
An ultrahigh vacuum scanning Kelvin probe force microscope (UHV SKPM) utilizing the gradient of electrostatic force, was developed based on an ultrahigh vacuum noncontact atomic force microscope (NC-AFM) capable of atomic level imaging, and used for simultaneous observation of contact potential difference (CPD) and NC-AFM images. CPD images of a Si(lll) surface with Au deposited, clearly showed the potential difference in phases between 7X7 and 5x2 structures. When Ag was deposited as a submonolayer on the Si(lll) 7x7 reconstructed surface, the atomic level lateral resolution was observed in CPD images as well as in NC-AFM topographic images. (C) 1998 American Institute of Physics.
引用
收藏
页码：3154 / 3156
页数：3
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