Epitaxial growth of lateral quantum dot molecules

We present an overview and a comparison between three different methods of creating low density lateral In(Ga)As quantum dot molecules (QDMs) embedded in a GaAs matrix. Each of them is based on the use of nanoholes to control the dot nucleation site and generate the QDMs. The three methods used to create suitable nanoholes are: (1) In situ excess gallium droplet etching, where the nanohole shape is modified by overgrowth of a thin GaAs buffer to give QDM nucleation. (2) Ex situ electron-beam lithographic patterning and wet-etching, where the patterned nanohole size is critical for formation of QDMs. (3) In situ strain-selective etching of buried InAs quantum dots by AsBr3. The mechanisms of QDM formation, dependence on growth parameters, advantages and disadvantages of each technique and future challenges are discussed.