Dry-etchced silicon-on-insulator waveguides with low propagation and fiber-coupling losses

被引：28

作者：

Solehmainen, K ^{[1
]}

Aalto, T ^{[1
]}

Dekker, J ^{[1
]}

Kapulainen, M ^{[1
]}

Harjanne, M ^{[1
]}

Kukli, K ^{[1
]}

Heimala, P ^{[1
]}

Kolari, K ^{[1
]}

Leskelä, M ^{[1
]}

机构：

[1] Univ Helsinki, Lab Inorgan Chem, Dept Chem, FIN-00014 Helsinki, Finland

来源：

JOURNAL OF LIGHTWAVE TECHNOLOGY | 2005年 / 23卷 / 11期

关键词：

atomic layer deposition (ALD); integrated optics; optical device fabrication; optical losses; optical waveguides; silicon-on-insulator (SOI) technology;

D O I：

10.1109/JLT.2005.857750

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Optical rib waveguides with various widths and heights were fabricated on silicon-on-insulator (SOI) substrates. Silicon etching was based on dry etching with inductively coupled plasma (ICP)-type reactive ion etcher. The etching process was developed to ensure low optical losses. Propagation loss of 0.13 +/- 0.02 dB/cm was measured for the fundamental mode at the wavelength of 1550 nm in a curved 114-cm-long waveguide. The reflection losses were suppressed by applying atomic layer deposition (ALD) in the growth of antireflection coatings (ARCs).

引用

页码：3875 / 3880

页数：6

共 17 条

[1] Development of silicon-on-insulator waveguide technology
Aalto, T
Harjanne, M
Kapulainen, M
Heimala, P
Leppihalme, M
[J]. INTEGRATED OPTICS: DEVICES, MATERIALS, AND TECHNOLOGIES VIII, 2004, 5355 : 81 - 95
[2] AALTO T, 2004, THESIS HELSINKI U TE
[3] Silicon oxynitride planar waveguiding structures for application in optical communication
de Ridder, RM
Wörhoff, K
Driessen, A
Lambeck, PV
Albers, H
[J]. IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 1998, 4 (06) : 930 - 937
[4] Edwards D.F., 1985, Handbook of optical constants of solids
[5] High performance germanium-on-silicon detectors for optical communications
Famà, S
Colace, L
Masini, G
Assanto, G
Luan, HC
[J]. APPLIED PHYSICS LETTERS, 2002, 81 (04) : 586 - 588
[6] 0.1 dB/cm waveguide losses in single-mode SOI rib waveguides
Fischer, U
Zinke, T
Kropp, JR
Arndt, F
Petermann, K
[J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 1996, 8 (05) : 647 - 648
[7] Recent advances in silicon etching for MEMS using the ASE™ process
Hynes, AM
Ashraf, H
Bhardwaj, JK
Hopkins, J
Johnston, I
Shepherd, JN
[J]. SENSORS AND ACTUATORS A-PHYSICAL, 1999, 74 (1-3) : 13 - 17
[8] ATOMIC LAYER EPITAXY GROWTH OF TANTALUM OXIDE THIN-FILMS FROM TA(OC2H5)(5) AND H2O
KUKLI, K
RITALA, M
LESKELA, M
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (05) : 1670 - 1675
[9] Proceedings of the First International Congress on Telehealth and Multimedia Technologies -: A multisector conference held in Edmonton, Alberta, Canada, 16-18 August 1999 -: Foreword
Miyazaki, M
[J]. JOURNAL OF TELEMEDICINE AND TELECARE, 2000, 6 : 1 - 2
[10] SILICON-ON-INSULATOR OPTICAL RIB WAVE-GUIDE LOSS AND MODE CHARACTERISTICS
RICKMAN, AG
REED, GT
NAMAVAR, F
[J]. JOURNAL OF LIGHTWAVE TECHNOLOGY, 1994, 12 (10) : 1771 - 1776

← 1 2 →