Formation of submicron cylindrical structures at silicon surface exposed to a compression plasma flow

被引：23
作者：
Uglov, VV
Anishchik, VM
Astashynski, VV
Astashynski, VM
Ananin, SI
Askerko, VV
Kostyukevich, EA
Kuz'mitski, AM
Kvasov, NT
Danilyuk, AL
机构：
[1] Belarusian State Univ, Minsk 220080, BELARUS
[2] Natl Acad Sci Belarus, Inst Atom & Mol Phys, Minsk 220072, BELARUS
[3] Belarussian State Univ Informat & Radioelect, Minsk, BELARUS
来源：
JETP LETTERS | 2001年 / 74卷 / 04期
关键词：
52.40.Hf; 79.20.Rf; 52.77.Bn; 68.35.Bs;
D O I：
10.1134/1.1413553
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Submicron-sized cylindrical structures were obtained at the surface of silicon single crystal exposed to a compression plasma flow. A periodic structure formed by channels oriented normally to the surface was observed inside the modified surface layer. The period of the structure corresponded to the spacing of the surface formations. (C) 2001 MAIK "Nauka/Interperiodica".
引用
收藏
页码：213 / 215
页数：3
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