Monitoring of Low Pressure Plasmas with a Calibrated Probe

被引：0
|
作者：
Runkel, Jan [1 ]
Schulz, Christian [1 ]
Rolfes, Ilona [1 ]
Oberberg, Moritz [2 ]
Awakowicz, Peter [2 ]
机构：
[1] Ruhr Univ Bochum, Inst Microwave Syst, D-44801 Bochum, Germany
[2] Ruhr Univ Bochum, Inst Elect Engn & Plasma Technol, D-44801 Bochum, Germany
来源：
2016 GERMAN MICROWAVE CONFERENCE (GEMIC) | 2016年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this contribution the use of the planar multipole resonance probe (pMRP) as a monitoring tool for low pressure plasmas is presented. By 3D electromagnetic simulations, the probe's ability to monitor two important plasma parameters is investigated and a full one-port calibration is applied to ensure maximum monitoring precision. Measurements in a double inductively coupled argon plasma confirm the simulation results and prove the suitability of the calibrated pMRP for precise plasma monitoring.
引用
收藏
页码：43 / 46
页数：4
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