Supported Ru-Pt Bimetallic Nanoparticle Catalysts Prepared by Atomic Layer Deposition

被引：190

作者：

Christensen, Steven T. ^{[1
]}

Feng, Hao ^{[1
]}

Libera, Joseph L. ^{[1
]}

Guo, Neng ^{[1
]}

Miller, Jeffrey T. ^{[1
]}

Stair, Peter C. ^{[1
,2
]}

Elam, Jeffrey W. ^{[1
]}

机构：

[1] Argonne Natl Lab, Argonne, IL 60439 USA

[2] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA

来源：

NANO LETTERS | 2010年 / 10卷 / 08期

关键词：

Atomic layer deposition; platinum; ruthenium; bimetallic catalysts; THIN-FILMS; OXIDATION; PLATINUM; PALLADIUM; ALUMINA; GROWTH; SIZE; GAS; IR;

D O I：

10.1021/nl101567m

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Atomic layer deposition (ALD) is used to deposit ruthenium-platinum nanostructured catalysts using 2,4-(dimethylpentadienyl)(ethylcyclopentadienyl) ruthenium, trimethyl(methylcyclopentadienyl) platinum, and oxygen as precursors. Transmission electron microscopy shows discrete 1.2 nm nanoparticles decorating the surface of the spherical alumina support. The Ru-Pt particles are crystalline and have a crystal structure similar to pure platinum. X-ray fluorescence measurements show that the nanoparticle composition is controlled by the ratio of metal precursor ALD cycles. X-ray absorption spectroscopy at the Ru K-edge indicates a nearest neighbor Ru-Pt interaction consistent with a bimetallic composition. Methanol decomposition reactions further confirm a Ru-Pt interaction and show enhanced methanol conversion for the bimetallic nanoparticles when compared to catalysts comprised of a mixture of pure Pt and Ru nanoparticles of similar loading. These results demonstrate that ALD is a viable technique for synthesizing mixed-metal nanostructures suitable for catalysis and other applications.

引用

页码：3047 / 3051

页数：5

共 32 条

[1] ALD of rhodium thin films from Rh(acac)3 and oxygen [J].