Effect of capacitance-voltage sweep on the flat-band voltage of metal-oxide-semiconductor device with high-k gate dielectric

被引:3
|
作者
Yang, HD [1 ]
Son, YN [1 ]
Choi, HJ [1 ]
Choi, SM [1 ]
Hwang, HS [1 ]
机构
[1] Gwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
关键词
dielectric; capacitance; sweep; flat-band; MOS;
D O I
10.1143/JJAP.44.L235
中图分类号
O59 [应用物理学];
学科分类号
摘要
The capacitance-voltage (C-V) characteristics with and without light-illumination were evaluated for a capacitor with a Pt gate on the atomic-layer-deposited HfO2 dielectric. The flat-band voltage (V-fb) is conventionally determined by a C-V curve. However, the extracted values of V-fb were dependent on the C-V sweep direction and the starting voltage of the sweep (V-start) The increasing differences between V-start and intrinsic V-fb (V-fb.i) results in the increasing deviations of V-fb front V-fb.i. Therefore. the value of V-start should be close to V-fb,V-i and different values of V-start must be applied to the devices with significantly different V-fb.i.
引用
收藏
页码:L235 / L237
页数:3
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