Characterization of TiO2 thin films in the EUV and soft X-ray region

被引:2
作者
Comisso, A. [1 ,2 ]
Giglia, A. [3 ]
Nardello, M. [1 ,2 ]
Tessarolo, E. [1 ,2 ]
Calvillo, L. [4 ]
Sertsu, M. G. [1 ,2 ]
Granozzi, G. [4 ]
Gerlin, F. [1 ,2 ]
Brigo, L. [5 ,6 ]
Nicolosi, P. [1 ,2 ]
机构
[1] Univ Padua, Dept Informat Engn, I-35131 Padua, Italy
[2] CNR, Inst Photon & Na Notechnol, Lab Ultraviolet & Xray Opt Res, I-35131 Padua, Italy
[3] CNR, Ist Officina Mat, I-34149 Trieste, Italy
[4] Univ Padua, Dept Chem Sci, I-35131 Padua, Italy
[5] Univ Padua, Dept Ind Engn, I-35131 Padua, Italy
[6] Univ Padua, INSTM Padova RU, I-35131 Padua, Italy
来源
EUV AND X-RAY OPTICS: SYNERGY BETWEEN LABORATORY AND SPACE IV | 2015年 / 9510卷
关键词
TiO2; thin films; e-beam; optical constants; extreme ultraviolet; soft x-rays; optical coatings; OPTICAL-CONSTANTS;
D O I
10.1117/12.2178142
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, three TiO2 thin films with thicknesses of 22.7, 48.5 and 102.9 nm were grown on Si (100) substrates by the technique of electron beam evaporation. The films were deposited at a substrate temperature of 150 degrees C with a deposition rate of 0.3 - 0.5 A/sec. The films thicknesses were characterized by spectroscopic ellipsometry and profilometry. The surface roughness was measured by AFM obtaining RMS of less than 0.7nm. Investigations performed by XPS method have shown that stoichiometric TiO2 was obtained on all the samples with no suboxide presences. Reflectance measurements of the samples were performed in EUV and SX spectral regions from 25.5 to 454.2eV using synchrotron radiation. Analyzing the refractive index N=n+ik of TiO2 thin films, optical constants (n,k) in this energy range were both determined by fitting the Fresnel equations with least-square fitting methods.
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页数:9
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