Cathodoluminescence and cross-sectional transmission electron microscopy studies for deformation behaviors of GaN thin films under Berkovich nanoindentation

被引:4
|
作者
Jian, Sheng-Rui [1 ]
Teng, I-Ju [2 ]
Lu, Jian-Ming [3 ]
机构
[1] I Shou Univ, Dept Mat Sci & Engn, Kaohsiung 840, Taiwan
[2] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 300, Taiwan
[3] Natl Ctr High Performance Comp, Natl Appl Res Labs, Tainan 74147, Taiwan
来源
NANOSCALE RESEARCH LETTERS | 2008年 / 3卷 / 04期
关键词
GaN; MOCVD; nanoindentation; cathodoluminescence; focused ion beam; transmission electron microscopy;
D O I
10.1007/s11671-008-9130-8
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this study, details of Berkovich nanoindentation-induced mechanical deformation mechanisms of metal-organic chemical-vapor deposition-derived GaN thin films have been systematic investigated with the aid of the cathodoluminescence (CL) and the cross-sectional transmission electron microscopy (XTEM) techniques. The multiple "pop-in" events were observed in the load-displacement (P-h) curve and appeared to occur randomly by increasing the indentation load. These instabilities are attributed to the dislocation nucleation and propagation. The CL images of nanoindentation show very well-defined rosette structures with the hexagonal system and, clearly display the distribution of deformation-induced extended defects/dislocations which affect CL emission. By using focused ion beam milling to accurately position the cross-section of an indented area, XTEM results demonstrate that the major plastic deformation is taking place through the propagation of dislocations. The present observations are in support to the massive dislocations activities occurring underneath the indenter during the loading cycle. No evidence of either phase transformation or formation of micro-cracking was observed by means of scanning electron microscopy and XTEM observations. We also discuss how these features correlate with Berkovich nanoindentation produced defects/dislocations structures.
引用
收藏
页码:158 / 163
页数:6
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