Magnetic Compton Profile Measurement of Thin Films

被引：2
作者：
Nishino, Hiroyuki [1 ,2 ]
Yamaki, Ryutaro [1 ,2 ]
Itou, Masayoshi [2 ]
Sakurai, Yoshiharu [2 ]
Sakurai, Hiroshi [1 ]
Ito, Masahisa [1 ]
机构：
[1] Gunma Univ, Dept Elect Engn, Grad Sch Engn, 1-5-1 Tenjin Cho, Kiryu, Gunma 3768515, Japan
[2] JASRI, Japan Synchrotron Radiat Res Inst, Hyogo, 6795198, Japan
来源：
SILICON SCIENCE AND ADVANCED MICRO-DEVICE ENGINEERING I | 2011年 / 459卷
关键词：
magnetic Compton scattering; thin film; magnetic nnultilayer; Pd/Co; SiN membrane substrate; ANISOTROPY;
D O I：
10.4028/www.scientific.net/KEM.459.11
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We have measured magnetic Compton profile of Co/Pd thin films sputtered on a substrate for studying the electronic structure. For the first time, a silicon nitride substrate of 100 nm thickness we used in the magnetic Compton scattering experiment. We have improved vacuum tubes of the Compton beam-line BL08W of SPring-8, and have reduced greatly the background scattering for the Compton profile. We have succeeded in measuring magnetic Compton profile of Co (0.8 nm)/Pd (1.6 nm) 400 nm multilayer.
引用
收藏
页码：11 / +
页数：2
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