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Electronic Properties of Armchair MoS2 Nanoribbons with Stacking Faults: First-Principles Calculations
被引:0
作者:
Xu, Weiwei
[1
]
Wang, Jianwei
[2
]
Laref, Amel
[3
]
Yang, Juan
[4
]
Wu, Xiaozhi
[1
]
Wang, Rui
[1
]
机构:
[1] Chongqing Univ, Inst Struct & Funct, Chongqing 401331, Peoples R China
[2] CAEP, Microsyst & Terahertz Res Ctr, Microsyst Technol Lab, Chengdu 610200, Sichuan, Peoples R China
[3] King Saud Univ, Coll Sci, Dept Phys & Astron, Riyadh 11451, Saudi Arabia
[4] Chongqing Jiaotong Univ, Coll Mat Sci & Engn, Chongqing 402247, Peoples R China
关键词:
Molybdenum disulfide;
nanoribbon;
stacking fault;
band structure;
HEXAGONAL BORON-NITRIDE;
EXTENDED LINE DEFECTS;
MONOLAYER MOS2;
GRAPHENE;
PHOTOLUMINESCENCE;
LAYERS;
GAN;
D O I:
10.1007/s11664-018-6445-9
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The band structures and partial charge densities of armchair MoS2 with and without stacking fault have been investigated using first-principles calculations. The band gaps of MoS2 with periodically arranged stacking fault increase with the decreasing of stacking fault density and converge to 0.27 eV, which is smaller than perfect MoS2 (1.76 eV). For MoS2 nanoribbons with stacking fault, the band gap increases for ribbon width L <= 18 and decreases slightly for L >= 18: The band gaps are smaller than that of MoS2 nanoribbons without stacking fault. The partial charge densities of armchair MoS2 nanoribbons with stacking fault are also presented. Results indicate that the defect levels originate from the stacking fault and are located in the forbidden band near the Fermi level. Therefore, the band gaps can be decreased by stacking fault.
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页码:5498 / 5508
页数:11
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