Antiferroelectric-to-ferroelectric phase transition in hexagonal rare-earth iron oxides

被引:8
作者
Chen, Binjie [1 ]
Hasegawa, Tetsuya [2 ]
Ohta, Hiromichi [3 ]
Katayama, Tsukasa [3 ,4 ]
机构
[1] Hokkaido Univ, Grad Sch Informat Sci & Technol, Kita Ku, N14W9, Sapporo, Hokkaido 0600814, Japan
[2] Univ Tokyo, Dept Chem, Bunkyo Ku, Tokyo 1130033, Japan
[3] Hokkaido Univ, Res Inst Elect Sci, Kita Ku, N20W10, Sapporo, Hokkaido 0010020, Japan
[4] JST PRESTO, Kawaguchi, Saitama 3320012, Japan
关键词
ROOM-TEMPERATURE; THIN-FILMS; MULTIFERROISM; BEHAVIOR; SURFACE; COBALT; ORDER; FIELD;
D O I
10.1039/d1tc05944k
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ferroic oxides often exhibit exotic behavior, accompanied by phase transitions. Hexagonal rare-earth iron oxides (h-RFeO3), a promising multiferroic system, have been reported to exhibit ferroelectricity (FE) when the lattice parameter ratio (c/a) exceeds 1.93 and antiferroelectricity (AFE) when c/a is equal to 1.89. Although the AFE-FE phase boundary in the h-RFeO3 systems is assumed to exist at c/a approximate to 1.9, the phase transition has not been observed so far due to the lack of samples with such a c/a ratio. In this study, we show the AFE-FE phase transition in h-RFeO3 films, where R = Dy. We fabricated h-DyFeO3 films with c/a ratios of 1.90-1.92 by controlling the film thicknesses. The h-DyFeO3 films with a c/a ratio of 1.91 exhibited AFE at temperatures below 200 K and FE at temperatures up to 300 K. The phase transition temperature (T-p) was modulated by the c/a ratio. The films also underwent an AFE-FE phase transition upon adjusting the frequency of the voltage applied at the T-p. We discuss the possible origin of the AFE-FE phase transition from the viewpoint of the migration length of the FE domain wall motion.
引用
收藏
页码:5621 / 5626
页数:6
相关论文
共 44 条
  • [1] Electrically tunable materials for microwave applications
    Ahmed, Aftab
    Goldthorpe, Irene A.
    Khandani, Amir K.
    [J]. APPLIED PHYSICS REVIEWS, 2015, 2 (01):
  • [2] Multiferroism in hexagonally stabilized TmFeO3 thin films below 120 K
    Ahn, Suk-Jin
    Lee, Jung-Hoon
    Jang, Hyun Myung
    Jeong, Young Kyu
    [J]. JOURNAL OF MATERIALS CHEMISTRY C, 2014, 2 (23) : 4521 - 4525
  • [3] Artificially imposed hexagonal ferroelectricity in canted antiferromagnetic YFeO3 epitaxial thin films
    Ahn, Suk-Jin
    Lee, Jung-Hoon
    Jeong, Young Kyu
    Na, Eun-Hye
    Koo, Yang Mo
    Jang, Hyun Myung
    [J]. MATERIALS CHEMISTRY AND PHYSICS, 2013, 138 (2-3) : 929 - 936
  • [4] XRD and HREM studies of epitaxially stabilized hexagonal orthoferrites RFeO3 (R = Eu-Lu)
    Bossak, AA
    Graboy, IE
    Gorbenko, OY
    Kaul, AR
    Kartavtseva, MS
    Svetchnikov, VL
    Zandbergen, HW
    [J]. CHEMISTRY OF MATERIALS, 2004, 16 (09) : 1751 - 1755
  • [5] Self-organization, condensation, and annihilation of topological vortices and antivortices in a multiferroic
    Chae, S. C.
    Horibe, Y.
    Jeong, D. Y.
    Rodan, S.
    Lee, N.
    Cheong, S. -W.
    [J]. PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, 2010, 107 (50) : 21366 - 21370
  • [6] Chiba D, 2011, NAT MATER, V10, P853, DOI [10.1038/NMAT3130, 10.1038/nmat3130]
  • [7] ORIGIN OF FERROELECTRICITY IN PEROVSKITE OXIDES
    COHEN, RE
    [J]. NATURE, 1992, 358 (6382) : 136 - 138
  • [8] Bulk magnetoelectricity in the hexagonal manganites and ferrites
    Das, Hena
    Wysocki, Aleksander L.
    Geng, Yanan
    Wu, Weida
    Fennie, Craig J.
    [J]. NATURE COMMUNICATIONS, 2014, 5
  • [9] Magnetic Structure and Ordering of Multiferroic Hexagonal LuFeO3
    Disseler, Steven M.
    Borchers, Julie A.
    Brooks, Charles M.
    Mundy, Julia A.
    Moyer, Jarrett A.
    Hillsberry, Daniel A.
    Thies, Eric L.
    Tenne, Dmitri A.
    Heron, John
    Holtz, Megan E.
    Clarkson, James D.
    Stiehl, Gregory M.
    Schiffer, Peter
    Muller, David A.
    Schlom, Darrell G.
    Ratcliff, William D.
    [J]. PHYSICAL REVIEW LETTERS, 2015, 114 (21)
  • [10] Scale-up and optimization of HfO2-ZrO2 solid solution thin films for the electrostatic supercapacitors
    Do Kim, Keum
    Lee, Young Hwan
    Gwon, Taehong
    Kim, Yu Jin
    Kim, Han Joon
    Moon, Taehwan
    Hyun, Seung Dam
    Park, Hyeon Woo
    Park, Min Hyuk
    Hwang, Cheol Seong
    [J]. NANO ENERGY, 2017, 39 : 390 - 399