Effect of the duty ratio on the indium tin oxide (ITO) film deposited by in-line pulsed DC magnetron sputtering method for resistive touch panel

被引:70
|
作者
Ahn, Min Hyung [1 ]
Cho, Eou-Sik [1 ]
Kwon, Sang Jik [1 ]
机构
[1] Kyungwon Univ, Dept Elect Engn, Songnam 461701, Kyunggi Do, South Korea
关键词
Reverse time; Frequency; Pulsed DC sputtering; Indium tin oxide (ITO); Duty ratio; RAY PHOTOELECTRON-SPECTROSCOPY; THIN-FILMS; PRESSURE;
D O I
10.1016/j.apsusc.2011.09.081
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The indium tin oxide (ITO) film was deposited on PET (polyethylene terephthalate) film using in-line pulsed DC magnetron sputtering system with different duty ratios. The reverse time and the frequency of pulsed DC power were changed to obtain the different duty ratios. From the electrical and optical properties such as the sheet resistance, resistivity, thickness and transmittance, the pulsed DC sputtered ITO/PET films were also superior to the DC sputtered ITO/PET films. The reverse time had little effect on the properties of the ITO/PET film and the frequency of pulsed DC power had an immerse effect on the properties of the ITO/PET films. The optimal ITO/PET film was obtained when the frequency was 200 kHz, the reverse time was 1 mu s, and the duty ratio was about 80%. Crown Copyright (C) 2011 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:1242 / 1248
页数:7
相关论文
共 22 条
  • [1] Characteristics of ITO-resistive touch film deposited on a PET substrate by in-line DC magnetron sputtering
    Ahn, Min Hyung
    Cho, Eou Sik
    Kwon, Sang Jik
    VACUUM, 2014, 101 : 221 - 227
  • [2] Effects of the Duty Ratio on the Niobium Oxide Film Deposited by Pulsed-DC Magnetron Sputtering Methods
    Eom, Ji Mi
    Oh, Hyun Gon
    Cho, Il Hwan
    Kwon, Sang Jik
    Cho, Eou Sik
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2013, 13 (11) : 7760 - 7765
  • [3] Influence of the Tin Concentration in Indium Tin Oxide (ITO) Films Deposited by DC Magnetron Sputtering for Touch Panels
    Cho, Sang Hyun
    Kim, Hyo Jin
    Lee, Sung Ho
    Woo, Jae Ik
    Song, Kyu Ho
    Song, Pung Keun
    JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, 2014, 9 (03) : 414 - 418
  • [4] High Quality Indium Tin Oxide (ITO) Film Growth by Controlling Pressure in RF Magnetron Sputtering
    Aliyu, M. M.
    Hossain, S.
    Husna, J.
    Dhar, N.
    Huda, M. Q.
    Sopian, K.
    Amin, N.
    2012 38TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 2012, : 2009 - 2013
  • [5] Electrical and surface properties of indium tin oxide (ITO) films by pulsed DC magnetron sputtering for organic light emitting diode as anode material
    Nam, Eunkyoung
    Kang, Young-Hun
    Son, Dong-Jin
    Jung, Donggeun
    Hong, Sung-Jei
    Kim, Young Sung
    SURFACE & COATINGS TECHNOLOGY, 2010, 205 : S129 - S132
  • [6] Effect of duty cycle on the electrical and optical properties of VOx film deposited by pulsed reactive magnetron sputtering
    Dong Xiang
    Wu Zhiming
    Xu Xiangdong
    Wei Xiongbang
    Jiang Yadong
    2013 INTERNATIONAL CONFERENCE ON OPTICAL INSTRUMENTS AND TECHNOLOGY: OPTOELECTRONIC DEVICES AND OPTICAL SIGNAL PROCESSING, 2013, 9043
  • [7] Epitaxial indium tin oxide films deposited on yttrium stabilized zirconia substrate by DC magnetron sputtering
    Huang, Gaige
    Yu, Qiaonan
    Kou, Shiwen
    Zhai, Pengwei
    Li, Guoqiang
    PHYSICA B-CONDENSED MATTER, 2021, 601
  • [8] Characterisation and Optimisation of Indium Tin Oxide Films Deposited by Pulsed DC Magnetron Sputtering for Heterojunction Silicon Wafer Solar Cell Applications
    Huang, Mei
    Hameiri, Ziv
    Venkataraj, Selvaraj
    Aberle, Armin G.
    Mueller, Thomas
    PV ASIA PACIFIC CONFERENCE 2012, 2013, 33 : 91 - 98
  • [9] Process Optimization of Aluminum-Doped Zinc Oxide Films by In-Line Pulsed-DC Sputtering and Its Application to Resistive Touch Panels
    Lee, Dong Hyun
    Ryu, Hyungseok
    Kwon, Sang Jik
    Cho, Eou-Sik
    SCIENCE OF ADVANCED MATERIALS, 2020, 12 (11) : 1607 - 1612
  • [10] The effect of post-annealing on Indium Tin Oxide thin films by magnetron sputtering method
    Park, J. H.
    Buurma, C.
    Sivananthan, S.
    Kodama, R.
    Gao, W.
    Gessert, T. A.
    APPLIED SURFACE SCIENCE, 2014, 307 : 388 - 392