Fabrication of High Aspect Ratio SU-8 Microstructures on Piezoelectric Transducers

被引:0
|
作者
Ramakrishnan, N. [1 ]
Nemade, Harshal B. [2 ]
Palathinkal, Roy Paily [3 ]
机构
[1] Monash Univ, Sch Engn, Sunway Campus, Bandar Sunway 46150, Malaysia
[2] Ctr Nanotechnol, Gauhati 781039, India
[3] Indian Inst Technol, Dept Elect & Commun Engn, Gauhati 781039, India
来源
关键词
SU-8; fabrication; MEMS; Microstructures; Piezoelectric Transducers; SAW Devices;
D O I
10.4028/www.scientific.net/AMM.110-116.3127
中图分类号
V [航空、航天];
学科分类号
08 ; 0825 ;
摘要
A methodology to fabricate high aspect ratio (HAR) SU-8 micro structures on piezoelectric and metallic substrates is presented. In this work, several fabrication trials were carried out to optimize the SU-8 fabrication process. The fabrication recipe mentioned in the SU-8 (Microchem, USA) datasheet is employed for the initial fabrication trials. The SU-8 structures (micropillars) fabricated during these trials resulted in poor bonding with the surface of piezoelectric substrate. In the later trials a thin film of OmniCoat (Microchem, USA) is coated over the substrate before coating the SU-8 film to improve the adhesion quality of the SU-8 micropillars to the substrate. The fabrication methodology used during the trails and results on the quality of the fabricated HAR SU-8 pillars are discussed in the paper.
引用
收藏
页码:3127 / +
页数:2
相关论文
共 50 条
  • [11] High throughput projection UV lithography of high-aspect-ratio thick SU-8 microstructures
    Ren Yang
    Chuck Mullen
    Mark Schaline
    Karl Reithmaier
    Ron Sheets
    Microsystem Technologies, 2008, 14 : 1233 - 1243
  • [12] Fabrication of high aspect ratio metallic microstructures on ITO glass substrate using reverse-side exposure of SU-8
    Lu, Chunhua
    Yin, Xuefeng
    Wang, Min
    SENSORS AND ACTUATORS A-PHYSICAL, 2007, 136 (01) : 412 - 416
  • [13] Fabrication of high-aspect-ratio microstructures using SU8 photoresist
    Liu, G
    Tian, Y
    Kan, Y
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2005, 11 (4-5): : 343 - 346
  • [14] Fabrication of high-aspect-ratio microstructures using SU8 photoresist
    G. Liu
    Y. Tian
    Y. Kan
    Microsystem Technologies, 2005, 11 : 343 - 346
  • [15] Overcoming SU-8 stiction in high aspect ratio structures
    Peele, AG
    Shew, BY
    Vora, KD
    Li, HC
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2005, 11 (2-3): : 221 - 224
  • [16] Overcoming SU-8 stiction in high aspect ratio structures
    A. G. Peele
    B. Y. Shew
    K. D. Vora
    H. C. Li
    Microsystem Technologies, 2005, 11 : 221 - 224
  • [17] Investigations of SU-8 removal from metallic high aspect ratio microstructures with a novel plasma technique
    Rainer Engelke
    Josef Mathuni
    Gisela Ahrens
    Gabi Gruetzner
    Martin Bednarzik
    Daniel Schondelmaier
    Bernd Loechel
    Microsystem Technologies, 2008, 14 : 1607 - 1612
  • [18] High aspect ratio grating fabrication in SU-8 resist by UV-Curing nanoimprint
    Wang, Xudi
    Ge, Liangjin
    Lu, Jingjing
    Fu, Shaojun
    2008 INTERNATIONAL CONFERENCE ON OPTICAL INSTRUMENTS AND TECHNOLOGY: MEMS/NEMS TECHNOLOGY AND APPLICATIONS, 2009, 7159
  • [19] Investigations of SU-8 removal from metallic high aspect ratio microstructures with a novel plasma technique
    Engelke, Rainer
    Mathuni, Josef
    Ahrens, Gisela
    Gruetzner, Gabi
    Bednarzik, Martin
    Schondelmaier, Daniel
    Loechel, Bernd
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2008, 14 (9-11): : 1607 - 1612
  • [20] Using megasonic development of SU-8 to yield ultra-high aspect ratio microstructures with UV lithography
    Williams, JD
    Wang, W
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2004, 10 (10): : 694 - 698