Geometry and lattice formation of surface layers of Sn growing on InSb{111}A,B

被引:10
作者
Ohtake, A
Nakamura, J
Eguchi, T
Osaka, T
机构
[1] WASEDA UNIV,KAGAMI MEM LAB MAT SCI & TECHNOL,SHINJUKU KU,TOKYO 169,JAPAN
[2] WASEDA UNIV,DEPT MAT SCI & ENGN,SHINJUKU KU,TOKYO 169,JAPAN
来源
PHYSICAL REVIEW B | 1996年 / 54卷 / 15期
关键词
D O I
10.1103/PhysRevB.54.10358
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Surfaces of Sn growing on InSb{111}A,B have been studied by using the reflection high-energy electron-diffraction intensity oscillation technique. The surfaces proceed in the formation of a bilayered lattice in the whole range of film thickness. However, the geometry of the outermost surface layer is quite different in bath systems: The growing surface on InSb(111)A smoothens with the same period as the lattice formation, whereas on InSb(lll)B, below and above 6 ML of Sn, smooth surfaces emerge every period of monolayer and bilayer, respectively. The monolayer-period change in surface geometry is ascribed to Sb segregation on the growing surface.
引用
收藏
页码:10358 / 10361
页数:4
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