Electrochromic films of tungsten oxyfluoride and electron bombarded tungsten oxide

被引:9
|
作者
Azens, A
Granqvist, CG
机构
[1] Department of Technology, Uppsala University, S-751 21 Uppsala
关键词
Li+ intercalation deintercalation; sputtering; oxide films; oxyfluoride films;
D O I
10.1016/S0927-0248(95)00177-8
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Reactive DC magnetron sputtering of W was performed in a plasma of Ar + O-2 with and without CF4 addition and a positive substrate bias. The durability under extended Li+ intercalation/deintercalation was excellent for electron bombarded oxide films and poor for oxyfluoride films, while the electrochromic colour/bleach dynamics was slow for the electron bombarded oxide but fast for the oxyfluoride. The range of optical modulation was large. Tandem films, with a thin protective layer of electron bombarded oxide covering a thicker oxyfluoride layer, were able to combine rapid dynamics with good durability.
引用
收藏
页码:333 / 340
页数:8
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