Tuning phase transition temperature of VO2 thin films by annealing atmosphere

被引：52
|
作者：
Liu, Xingxing [1 ,2 ]
Wang, Shao-Wei [1 ,2 ]
Chen, Feiliang [1 ,2 ]
Yu, Liming [1 ,2 ]
Chen, Xiaoshuang [1 ,2 ]
机构：
[1] Chinese Acad Sci, Shanghai Inst Tech Phys, Natl Lab Infrared Phys, Shanghai 200083, Peoples R China
[2] Shanghai Engn Res Ctr Energy Saving Coatings, Shanghai 200083, Peoples R China
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2015年 / 48卷 / 26期
基金：
中国国家自然科学基金;
关键词：
VO2; phase transition temperature; annealing atmosphere; magnetron sputtering; METAL; STOICHIOMETRY; OXIDES;
D O I：
10.1088/0022-3727/48/26/265104
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
A simple new way to tune the optical phase transition temperature of VO2 films was proposed by only controlling the pressure of oxygen during the annealing process. Vanadium films were deposited on glass by a large-scale magnetron sputtering coating system and then annealed in appropriate oxygen atmosphere to form the VO2 films. The infrared transmission change (at 2400 nm) is as high as 58% for the VO2 thin film on the glass substrate, which is very good for tuning infrared radiation and energy saving as smart windows. The phase transition temperature of the films can be easily tuned from an intrinsic temperature to 44.7 degrees C and 40.2 degrees C on glass and sapphire by annealing oxygen pressure, respectively. The mechanism is: V3+ ions form in the film when under anaerobic conditions, which can interrupt the V4+ chain and reduce the phase transition temperature. The existence of V3+ ions has been observed by x-ray photoelectron spectroscopy (XPS) experiments as proof.
引用
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页数：8
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