A modified layer-removal method for residual stress measurement in electrodeposited nickel films

被引:14
|
作者
Jiang, L. M. [1 ,2 ]
Peng, J. [1 ]
Liao, Y. G. [3 ]
Zhou, Y. C. [1 ]
Liang, J. [1 ]
Hao, H. X. [1 ]
Lu, C. [4 ]
机构
[1] Xiangtan Univ, Key Lab Low Dimens Mat & Applicat Technol, Minist Educ, Xiangtan 411105, Hunan, Peoples R China
[2] Hunan Univ Technol, Coll Packaging & Mat Engn, Changsha 412007, Hunan, Peoples R China
[3] Univ S China, Fac Math & Phys, Hengyang 421001, Hunan, Peoples R China
[4] Curtin Univ, Dept Mech Engn, Perth, WA 6845, Australia
基金
中国国家自然科学基金;
关键词
Layer-removal method; Nickel; Thin films; Residual stress; Nanoindentation; STRAIN FIELD-MEASUREMENTS; THIN-FILMS; INDENTATION; THICKNESS;
D O I
10.1016/j.tsf.2011.01.260
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Combining the traditional layer-removal method with a cantilever beam model, a modified layer-removal method is developed and used to measure residual stress in single and multi-layer electrodeposited nickel films with thickness of 2.5 mu m. The out-of-plane displacement of the free tip of a cantilever beam is measured by the digital speckle correlation method. The results show that residual stress in a single semimat nickel film is compressive, while in a multi-layer system composed of dark, semimat and holophote nickel, residual stress in the surface layer is tensile. Residual stress decreases gradually with the increase of etching depths of single and multi-layer films. These findings are in qualitative agreement with nanoindentation tests, which confirms the reliability of the modified layer-removal method. (C) 2011 Elsevier B.V. All rights reserved.
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页码:3249 / 3253
页数:5
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