10-W/mm AlGaN-GaNHFET with a field modulating plate

被引:230
|
作者
Ando, Y [1 ]
Okamoto, Y [1 ]
Miyamoto, H [1 ]
Nakayama, T [1 ]
Inoue, T [1 ]
Kuzuhara, M [1 ]
机构
[1] NEC Corp Ltd, Photon & Wireless Devices Res Lab, Otsu, Shiga 5200833, Japan
关键词
FET; field modulating plate (FP); GaN;
D O I
10.1109/LED.2003.812532
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
AlGaN-GaN heterojunction field-effect transistors (HFETs) with a field modulating plate (FP) were fabricated on an SiC substrate. The gate-drain breakdown voltage (BVgd) was significantly improved by employing an FP electrode, and the highest BVgd of 160 V was obtained with an FP length (L-FP) Of 1 mum. The maximum drain current achieved was 750 mA/mm, together with negligibly small current collapse. A 1-mm-wide FP-FET (L-FP = 1 mum) biased at a drain voltage of 65 V demonstrated a continuous wave saturated output power of 10.3 W with a linear gain of 18.0 dB and a power-added efficiency of 47.3% at 2 GHz. To our knowledge, the power density of 10.3 W/mm is the highest ever achieved for any FET of the same gate size.
引用
收藏
页码:289 / 291
页数:3
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