Selective oxygen plasma etching of coatings

被引：47

作者：

Cvelbar, U ^{[1
]}

Mozetic, M

Klanjsek-Gunde, M

机构：

[1] Jozef Stefan Inst, Plasma Lab, SI-1000 Ljubljana, Slovenia

[2] Natl Inst Chem, SI-1000 Ljubljana, Slovenia

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2005年 / 33卷 / 02期

关键词：

oxygen plasma; pigmented coatings; pigment dispersion; selective etching;

D O I：

10.1109/TPS.2005.845345

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The technology of selective oxygen plasma etching is presented. It enables the evaluation of the state of pigment dispersion, as well as the distribution of other solid particles that are added in pigmented coatings for various functional purposes. The technology is based on the selective interaction of reactive gaseous particles from oxygen plasma with the pigment-polymer composite. In our case, we wanted to etch the polymer matrix while leaving the particles untouched. Scanning electron microscope images of the effects of exposing the composite to oxygen plasma are presented.

引用

页码：236 / 237

页数：2