Direct electrodeposition of metal nanowires on electrode surface

被引:23
作者
Gambirasi, Arianna [1 ,2 ]
Cattarin, Sandro [1 ]
Musiani, Marco [1 ]
Vazquez-Gomez, Lourdes [1 ]
Verlato, Enrico [1 ]
机构
[1] CNR, Ist Energet & Interfasi IENI, I-35127 Padua, Italy
[2] Univ Ca Foscari Venezia, Dipartimento Sci Mol & Nanosistemi, I-30172 Venice, VE, Italy
关键词
Electrochemical deposition; Membrane template; Metal nanostructures; Porous electrodes; Electron backscatter diffraction; ELECTROCHEMICAL DEPOSITION; TEMPLATED ELECTROSYNTHESIS; NI; NUCLEATION; IMPEDANCE; GROWTH; ARRAYS; COPPER; CU;
D O I
10.1016/j.electacta.2011.07.045
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
A method for decorating the surface of disk electrodes with metal nanowires is presented. Cu and Ni nanowires with diameters from 1.0 mu m to 0.2 mu m are directly deposited on the electrode surface using a polycarbonate membrane filter template maintained in contact with the metal substrate by the soft homogeneous pressure of a sponge soaked with electrolyte. The morphologic and structural properties of the deposit are characterized by scanning electron microscopy (SEM) and electron backscatter diffraction (EBSD). The latter shows that the head of nanowires with diameter of 0.4 mu m is ordinarily polycrystalline, and that of nanowires with diameter of 0.2 mu m is almost always monocrystalline for Cu and frequently also for Ni. Cyclic voltammetries and impedance investigations recorded in alkaline solutions at representative Ni electrodes decorated with nanowires provide consistent values of roughness factor, in the range 20-25. (C) 2011 Elsevier Ltd. All rights reserved.
引用
收藏
页码:8582 / 8588
页数:7
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