Study on the Structure and Reflectivity of Yb/Al Multilayers Prepared by Different Base Pressure

被引:1
|
作者
Xiao Liangsheng [1 ]
Qi Runze [2 ,3 ]
Lai Bo [2 ,3 ]
Huang Qiushi [2 ,3 ]
Wu Jiali [2 ,3 ]
Yu Yue [2 ,3 ]
Xin Zihua [1 ]
机构
[1] Shanghai Univ, Dept Phys, Shanghai 200444, Peoples R China
[2] Tongji Univ, Inst Precis Opt Engn, Sch Phys Sci & Engn, Shanghai 200092, Peoples R China
[3] MOE Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China
基金
中国国家自然科学基金;
关键词
Ultraviolet radiation; Vacuum deposition; Multilayers; Reflection; Magnetron sputtering; OPTICAL-CONSTANTS; EXTREME-ULTRAVIOLET; REFLECTANCE MEASUREMENTS; NARROW-BAND; THIN-FILMS; SOLAR; COATINGS; MISSION; PERFORMANCE; NM;
D O I
10.3788/gzxb20215011.1131001
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In order to study the effect of base pressure on the microstructure and optical properties of Yb/ Al multilayers,a series of SiC/(Yb/Al)(3) period multilayers with the same structure were prepared by DC magnetron sputtering under base pressure conditions of 4 x 10(-5) Pa, 8 x 10(-5) Pa, 1 x 10(-4) Pa, 2 x 10(-4) Pa and 4 x 10(-4) Pa,respectively. The surface and internal structures of Yb/Al multilayers were characterized by X- ray grazing incident reflection, atomic force microscopy and wide- angle X-ray diffraction. The results show that the average interface width of Yb/Al multilayers decreases from 2.15 nm to 1.82 nm with the raise of base pressure from 4 x 10(-4) Pa to 4 x 10(-5) Pa;the surface roughness decreases from 1.87 nm to 1.43 nm. Yb, Yb2O3 and Al polycrystalline grains are formed in the film,and the grain size increases slightly. The stress of SiC/(Yb/Al)(3) period multilayer is tensile,and the stress increases from 85 MPa to 142 MPa with the base pressure raising from 4 x 10(-4) Pa to 4 x 10(-5) Pa. The reflectivity of the sample prepared under 4 x 10(-5) Pa base pressure was measured. When the wavelength is 73.6 nm and the incident angle is 5 degrees,the reflectivity of the sample is 31.3%.
引用
收藏
页数:8
相关论文
共 42 条
  • [1] Experimental determination of optical constants of MgF2 and AlF3 thin films in the vacuum ultra-violet wavelength region (60-124 nm), and its application to optical designs
    Bridou, F.
    Cuniot-Ponsard, M.
    Desvignes, J. -M.
    Richter, M.
    Kroth, U.
    Gottwald, A.
    [J]. OPTICS COMMUNICATIONS, 2010, 283 (07) : 1351 - 1358
  • [2] SOHO - THE SOLAR AND HELIOSPHERIC OBSERVATORY
    DOMINGO, V
    FLECK, B
    POLAND, AI
    [J]. SPACE SCIENCE REVIEWS, 1995, 72 (1-2) : 81 - 84
  • [3] DONG Maojin, 2010, VACUUM LOW TEMPERATU, V16, P233
  • [4] Optical constants of Yb films in the 23-1700 eV range
    Fernandez-Perea, Monica
    Larruquert, Juan I.
    Aznarez, Jose A.
    Mendez, Jose A.
    Poletto, Luca
    Garoli, Denis
    Malvezzi, A. Marco
    Giglia, Angelo
    Nannarone, Stefano
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 2007, 24 (12) : 3691 - 3699
  • [5] Reflectance measurements and optical constants in the extreme ultraviolet-vacuum ultraviolet regions for SiC with a different C/Si ratio
    Garoli, Denis
    Frassetto, F.
    Monaco, G.
    Nicolosi, P.
    Pelizzo, M. -G.
    Rigato, F.
    Rigato, V.
    Giglia, A.
    Nannarone, S.
    [J]. APPLIED OPTICS, 2006, 45 (22) : 5642 - 5650
  • [6] High-performance deep-ultraviolet optics for free-electron lasers
    Gatto, A
    Thielsch, R
    Heber, J
    Kaiser, N
    Ristau, D
    Günster, S
    Kohlhaas, J
    Marsi, M
    Trovò, M
    Walker, R
    Garzella, D
    Couprie, ME
    Torchio, P
    Alvisi, M
    Amra, C
    [J]. APPLIED OPTICS, 2002, 41 (16) : 3236 - 3241
  • [7] Characterization and optimization of magnetron sputtered Sc/Si multilayers for extreme ultraviolet optics
    Gautier, J.
    Delmotte, F.
    Bridou, F.
    Ravet, M. F.
    Varniere, F.
    Roulliay, M.
    Jerome, A.
    Vickridge, I.
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2007, 88 (04): : 719 - 725
  • [8] EFFECTS OF VACUUM DEPOSITION CONDITIONS ON ELLIPSOMETRIC PARAMETERS, OPTICAL-CONSTANTS, AND REFLECTANCE OF ULTRAPURE ALUMINUM FILMS
    HALFORD, JH
    CHIN, FK
    NORMAN, JE
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1973, 63 (07) : 786 - 792
  • [9] Modulation of the microstructure, optical and electrical properties of sputtering-driven Yb2O3 gate dielectrics by sputtering power and annealing treatment
    Hao, Lin
    He, Gang
    Fang, Zebo
    Wang, Die
    Sun, Zhaoqi
    Liu, Yanmei
    [J]. APPLIED SURFACE SCIENCE, 2020, 508
  • [10] Impact and origin of the oxide-interface traps in Al/Yb2O3/n-Si/Al on the electrical characteristics
    Kahraman, Aysegul
    Karacali, Huseyin
    Yilmaz, Ercan
    [J]. JOURNAL OF ALLOYS AND COMPOUNDS, 2020, 825