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Dislocation dynamics simulations with climb: kinetics of dislocation loop coarsening controlled by bulk diffusion
被引:68
|作者:
Bako, Botond
[1
]
Clouet, Emmanuel
[1
]
Dupuy, Laurent M.
[2
]
Bletry, Marc
[3
]
机构:
[1] CEA, DEN, Serv Rech Met Phys, F-91191 Gif Sur Yvette, France
[2] CEA, DEN, Serv Rech Met Appl, F-91191 Gif Sur Yvette, France
[3] Inst Chim & Mat Paris Est, CNRS, UMR 7182, F-94320 Thiais, France
关键词:
dislocation climb;
dislocation loops;
coarsening;
diffusion;
dislocation dynamics;
NEUTRON-IRRADIATION;
QUENCHED ALUMINIUM;
MOLECULAR-DYNAMICS;
MOBILITY;
SILICON;
MECHANISMS;
CRYSTALS;
EQUATION;
DEFECTS;
METALS;
D O I:
10.1080/14786435.2011.573815
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Dislocation climb mobilities, assuming vacancy bulk diffusion, are derived and implemented in dislocation dynamics simulations to study the coarsening of vacancy prismatic loops in fcc metals. When loops cannot glide, comparison of the simulations with a coarsening model based on the line tension approximation shows good agreement. Dislocation dynamics simulations with both glide and climb are then performed. Allowing for glide of the loops along their prismatic cylinders leads to faster coarsening kinetics, as direct coalescence of the loops is now possible.
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页码:3173 / 3191
页数:19
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