Thermoregulated Copper-Free Sonogashira Coupling in Water
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作者:
Liu, Ning
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Dalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R ChinaDalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R China
Liu, Ning
[1
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Liu, Chun
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Dalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R ChinaDalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R China
Liu, Chun
[1
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Xu, Qiang
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Dalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R ChinaDalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R China
Xu, Qiang
[1
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Jin, Zilin
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Dalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R ChinaDalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R China
Jin, Zilin
[1
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[1] Dalian Univ Technol, State Key Lab Fine Chem, Dalian 116024, Peoples R China
The Sonogashira cross-coupling reaction between aryl halides and terminal alkynes was carried out smoothly in water over a thermoregulated ligand-palladium catalyst under copper-free conditions, resulting in good to excellent yields. The Sonogashira reaction was sensitive to the electronic nature of the substituents on the aryl halides. Aryl halides with an electron-withdrawing group showed higher reactivity than those with an electron-donating group. Particularly, this protocol could be applied to the synthesis of liquid crystals involving trans-cyclohexyltolans. The products could be separated from the reaction system easily by decanting, and the catalyst was recovered in water and used directly for the next run.
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Osaka Inst Technol, Fac Engn, Dept Appl Chem, Asahi Ku, Osaka 5358585, JapanOsaka Inst Technol, Fac Engn, Dept Appl Chem, Asahi Ku, Osaka 5358585, Japan
Teratani, Takuto
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Ohtaka, Atsushi
Kawashima, Takahiro
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Osaka Inst Technol, Fac Engn, Dept Appl Chem, Asahi Ku, Osaka 5358585, JapanOsaka Inst Technol, Fac Engn, Dept Appl Chem, Asahi Ku, Osaka 5358585, Japan
Kawashima, Takahiro
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Shimomura, Osamu
Nomura, Ryoki
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Osaka Inst Technol, Fac Engn, Dept Appl Chem, Asahi Ku, Osaka 5358585, Japan
Osaka Inst Technol, Nanomat & Microdevices Res Ctr, Asahi Ku, Osaka 5358585, JapanOsaka Inst Technol, Fac Engn, Dept Appl Chem, Asahi Ku, Osaka 5358585, Japan