All-MOCVD Technology for Coated Conductor Fabrication

The deposition of all buffer and YBCO layers for coated conductors via MOCVD represents one of the lowest possible capital and operational cost approaches to coated conductor manufacturing. Modular design of our prototype MOCVD system allows for either in-line or parallel fabrication of any number of buffer layers and YBCO layers. At 77 K in self-field I-c > 200 A/cm has been reproducibly demonstrated on all-MOCVD architecture, the best up-to-date result being I-c = 236 A/cm and J(c) = 2.13 MA/cm(2). Measurements performed at 4.2 K in 12 T magnetic field have shown J(e) = 278 A/mm(2). The results achieved, combined with the low cost, make the all-MOCVD coated conductors very promising materials for application both at liquid nitrogen and liquid helium temperatures.