Annealing effects on the hardening of electroless plated Ni-P layer by boron implantation

被引：4
作者：
Hanamoto, K
Sasaki, M
Miyashita, T
Kido, Y
Nakayama, Y [1 ]
Kawamoto, Y
Fujiwara, M
Kaigawa, R
机构：
[1] Ritsumeikan Univ, Dept Phys, Shiga 5258577, Japan
[2] TOWA Corp, Kyoto 6100231, Japan
[3] Ryukoku Univ, Fac Sci & Technol, Dept Mat Chem, Otsu, Shiga 5202194, Japan
[4] Ryukoku Univ, Dept Elect & Informat, Otsu, Shiga 5202194, Japan
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1998年 / 145卷 / 03期
关键词：
electroless plated Ni-P layer; ion implantation; vickers hardness; X-ray photoelectron spectroscopy;
D O I：
10.1016/S0168-583X(98)00419-4
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Annealing effects of hardening of electroless plated Ni-P layer on an iron based alloy have been studied in connection with 200 keV boron ion implantation at a dose of 1 x 10(17) ions/cm(2). Increases of Vickers hardness in the near-urface region were observed to an extent of 17% for the pre-annealed specimens compared to unimplanted ones. Post-nnealed specimens did not show effective hardening by the implantation treatment. The chemical states of implanted ions were studied by X-ray photoelectron spectroscopy (XPS) and the results may suggest that the increase of hardness is not due to the precipitation of nickel borides, but rather due to amorphization of Ni and Ni3P. (C) 1998 Elsevier Science B.V. All rights reserved.
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收藏
页码：391 / 394
页数：4
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