Low temperature tunneling current enhancement in silicide/Si Schottky contacts with nanoscale barrier width

被引:6
|
作者
Reckinger, Nicolas [1 ]
Tang, Xiaohui [1 ]
Dubois, Emmanuel [2 ]
Larrieu, Guilhem [2 ]
Flandre, Denis [1 ]
Raskin, Jean-Pierre [1 ]
Afzalian, Aryan [1 ]
机构
[1] Catholic Univ Louvain, ICTEAM, B-1348 Louvain, Belgium
[2] IEMN ISEN, UMR CNRS 8520, F-59652 Villeneuve Dascq, France
关键词
SOURCE/DRAIN; EMISSION; MOSFETS; BODY;
D O I
10.1063/1.3567546
中图分类号
O59 [应用物理学];
学科分类号
摘要
The low temperature electrical behavior of adjacent silicide/Si Schottky contacts with or without dopant segregation is investigated. The electrical characteristics are very well modeled by thermionic-field emission for nonsegregated contacts separated by micrometer-sized gaps. Still, an excess of current occurs at low temperature for short contact separations or dopant-segregated contacts when the voltage applied to the device is sufficiently high. From two-dimensional self-consistent nonequilibrium Green's function simulations, the dependence of the Schottky barrier profile on the applied voltage, unaccounted for in usual thermionic-field emission models, is found to be the source of this deviation. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3567546]
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页数:3
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