Pushing the Composition Limit of Anisotropic Ge1-xSnx Nanostructures and Determination of Their Thermal Stability

被引:36
作者
Seifner, Michael S. [1 ]
Hernandez, Sergi [2 ,3 ]
Bernardi, Johannes [4 ]
Romano-Rodriguez, Albert [2 ,3 ]
Barth, Sven [1 ]
机构
[1] TU Wien, Inst Mat Chem, Getreidemarkt 9, A-1060 Vienna, Austria
[2] Univ Barcelona, Dept Elect, MIND, Marti i Franques 1, E-08028 Barcelona, Spain
[3] Univ Barcelona, Inst Nanosci & Nanotechnol IN2UB, Marti i Franques 1, E-08028 Barcelona, Spain
[4] TU Wien, USTEM, Wiedner Hauptstr 8-10, A-1040 Vienna, Austria
基金
奥地利科学基金会;
关键词
OPTICAL-PROPERTIES; ELECTRONIC-STRUCTURE; ALLOY NANOCRYSTALS; LIGHT-EMISSION; BAND-GAP; ALPHA-SN; TIN; GERMANIUM; GROWTH; TEMPERATURE;
D O I
10.1021/acs.chemmater.7b03969
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Ge1-xSnx nanorods (NRs) with a nominal Sn content of 28% have been prepared by a modified microwave-based approach at very low temperature (140 degrees C) with Sn as growth promoter. The observation of a Sn-enriched region at the nucleation site of NRs and the presence of the low-temperature alpha-Sn phase even at elevated temperatures support a template-assisted formation mechanism. The behavior of two distinct Ge1-xSnx compositions with a high Sn content of 17% and 28% upon thermal treatment has been studied and reveals segregation events occurring at elevated temperatures, but also demonstrates the temperature window of thermal stability. In situ transmission electron microscopy investigations revealed a diffusion of metallic Sn clusters through the Ge1-xSnx NRs at temperatures where the material composition changes drastically. These results are important for the explanation of distinct composition changes in Ge1-xSnx and the observation of solid diffusion combined with dissolution and redeposition of Ge1-ySny (x > y) exhibiting a reduced Sn content. Absence of metallic Sn results in increased temperature stability by similar to 70 degrees C for Ge0.72Sn0.28 NRs and similar to 60 degrees C for Ge0.83Sn0.17 nanowires (NWs). In addition, a composition-dependent direct bandgap of the Ge1-xSnx NRs and NWs with different composition is illustrated using Tauc plots.
引用
收藏
页码:9802 / 9813
页数:12
相关论文
共 50 条
  • [31] Liquid phase epitaxy of Ge1-xSnx semiconductor films
    Saidov, AS
    Razzakov, AS
    Koshchanov, ÉA
    TECHNICAL PHYSICS LETTERS, 2001, 27 (08) : 698 - 700
  • [32] Effect of atomic deuterium irradiation on initial growth of Sn and Ge1-xSnx on Ge(001) substrates
    Shinoda, Tatsuya
    Nakatsuka, Osamu
    Shimura, Yosuke
    Takeuchi, Shotaro
    Zaima, Shigeaki
    APPLIED SURFACE SCIENCE, 2012, 259 : 754 - 757
  • [33] A novel method to synthesize bulk super saturated solid solutions Ge1-xSnx (x≤5.0%)
    Ponnambalam, V.
    Morelli, Donald T.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2018, 740 : 42 - 46
  • [34] First-Principal Investigation of Lattice Constants of Si1-xGex, Si1-xSnx and Ge1-xSnx
    Sun, Shengliu
    Zhang, Lixin
    Huang, Wenqi
    Chen, Zhenyu
    Wang, Hao
    Zhang, Chunqian
    NANO HYBRIDS AND COMPOSITES, 2022, 34 : 77 - 82
  • [35] Low temperature growth of Ge1-xSnx buffer layers for tensile-strained Ge layers
    Shimura, Yosuke
    Tsutsui, Norimasa
    Nakatsuka, Osamu
    Sakai, Akira
    Zaima, Shigeaki
    THIN SOLID FILMS, 2010, 518 : S2 - S5
  • [36] Ge1-xSnx alloy quantum dots with composition-tunable energy gaps and near-infrared photoluminescence
    Tallapally, Venkatesham
    Nakagawara, Tanner A.
    Demchenko, Denis O.
    Ozguer, Umit
    Arachchige, Indika U.
    NANOSCALE, 2018, 10 (43) : 20296 - 20305
  • [37] Development of nanostructured Ge1-xSnx alloy using ion beam techniques for band gap engineering
    Bhowmik, Gourav
    Huang, Mengbing
    2018 IEEE NANOTECHNOLOGY SYMPOSIUM (ANTS), 2018,
  • [38] Development of epitaxial growth technology for Ge1-xSnx alloy and study of its properties for Ge nanoelectronics
    Nakatsuka, Osamu
    Shimura, Yosuke
    Takeuchi, Wakana
    Taoka, Noriyuki
    Zaima, Shigeaki
    SOLID-STATE ELECTRONICS, 2013, 83 : 82 - 86
  • [39] Epitaxial growth of Ge1-xSnx thin film with Sn composition of 50% and possibility of Ge-Sn ordered bonding structure formation
    Shibayama, Shigehisa
    Shibata, Kaito
    Sakashita, Mitsuo
    Kurosawa, Masashi
    Nakatsuka, Osamu
    APPLIED PHYSICS EXPRESS, 2024, 17 (11)
  • [40] Virtual substrate technology for Ge1-XSnX heteroepitaxy on Si substrates
    Kostecki, K.
    Oehme, M.
    Koerner, R.
    Widmann, D.
    Gollhofer, M.
    Bechler, S.
    Mussler, G.
    Buca, D.
    Kasper, E.
    Schulze, J.
    SIGE, GE, AND RELATED COMPOUNDS 6: MATERIALS, PROCESSING, AND DEVICES, 2014, 64 (06): : 811 - 818