Anisotropic In-Plane Ballistic Transport in Monolayer Black Arsenic-Phosphorus FETs

被引:79
作者
Zhou, Wenhan [1 ]
Zhang, Shengli [1 ]
Wang, Yangyang [2 ]
Guo, Shiying [1 ]
Qu, Hengze [1 ]
Bai, Pengxiang [1 ]
Li, Zhi [1 ]
Zeng, Haibo [1 ]
机构
[1] Nanjing Univ Sci & Technol, Coll Mat Sci & Engn, Minist Ind & Informat Technol, Key Lab Adv Display Mat & Devices, Nanjing 210094, Peoples R China
[2] China Acad Space Technol, Qian Xuesen Lab Space Technol, Nanophoton & Optoelect Res Ctr, Beijing 100094, Peoples R China
基金
国家自然科学基金重大研究计划; 中国国家自然科学基金;
关键词
2D FETs; arsenic phosphorus; ballistic transport; electronic properties; first-principle simulations; DIRECT BANDGAP; MOBILITY; SEMICONDUCTORS; OPPORTUNITIES; PERFORMANCE; OXIDES;
D O I
10.1002/aelm.201901281
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The performance limits of monolayer arsenic-phosphorus (AsP) field-effect transistors (FETs) are explored by first-principles simulations of ballistic transport in nanoscale devices. The monolayer AsP holds a direct bandgap of 0.92 eV with significantly anisotropic electronic properties. Transfer characteristics of n-type and p-type AsP FETs are thoroughly investigated by scaling channel length in the armchair and zigzag direction, respectively. The simulation results indicate that AsP FETs exhibit exceptional device characteristics, such as high on-state current, short delay time, and low power consumption. Moreover, transfer characteristics demonstrate superior anisotropy on in-plane electrical transport properties. In particular, in the zigzag direction, even if the channel length is scaled down to 4 nm, the device performance still can satisfy the International Technology Roadmap for Semiconductors high-performance requirement. Finally, through benchmarking energy-delay product against other typical 2D FETs, AsP FETs are revealed to be strongly competitive 2D FETs.
引用
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页数:6
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