Characterizing microroughness and haze on silicon wafers

被引:0
作者
Bullis, WM
机构
[1] R and D at Siltec Silicon
[2] Electron Devices Division, National Board of Standards
[3] Miami University
[4] MIT
[5] Electrochemical Society
[6] American Physics Society, IEEE
[7] ASTM's Committee F-1 on Electronics
[8] SEMI's Intl. Standards Committee
来源
MICRO | 1996年 / 14卷 / 01期
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:47 / 53
页数:7
相关论文
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[Anonymous], 1995, OPTICAL SCATTERING M
[2]  
STOVER JC, 1995, OPTICAL SCATTERING M, pCH1
[3]  
STRAUSSER YE, 1994, 1994 SPR M EL SOC SA
[4]  
1985, ANSIASME B461
[5]  
1995, ASTM F124195