A Novel Fan-Out Concept for Ultra-High Chip-to-Chip Interconnect Density with 20-μm Pitch

被引:20
作者
Podpod, A. [1 ]
Slabbekoorn, J. [1 ]
Phommahaxay, A. [1 ]
Duval, F. [1 ]
Salahouedlhadj, A. [1 ]
Gonzalez, M. [1 ]
Rebibis, K. [1 ]
Miller, R. A. [1 ]
Beyer, G. [1 ]
Beyne, E. [1 ]
机构
[1] Interuniv Microelect Ctr IMEC, Leuven, Belgium
来源
2018 IEEE 68TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (ECTC 2018) | 2018年
关键词
component; Fan-Out; Wafer Level Package; Heterogenous Integration; Flip-Chip; warpage; die shift; wafer molding; ultra high density;
D O I
10.1109/ECTC.2018.00063
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The rapid growth of data bandwidth required between logic and memory chips for next generation device nodes is progressively pushing low I/O count serial busses to their limits. To further satisfy this increasing need for high data rates, wider I/O count busses are now being developed and established. Over the past years, various Fan-Out Wafer-Level-Packaging (FOWLP) approaches have been developed to answer the needs mentioned above and the increasingly demanding function integration on package. Imec has been working on a novel 300mm Fan-Out Wafer-Level-Packaging concept that enables 20 mu m pitch interconnect density. Results from experiments demonstrates wafer bow below 500 mu m after molding on silicon substrate with ultra-low die shift with maximum die to carrier mismatch below 10 mu m on full 300mm wafers. Further warpage and die shift evolution are expected depending on the process steps the wafers must go through and will be further discussed.
引用
收藏
页码:370 / 378
页数:9
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