Ultra-small size (1-20 μm) blue and green micro-LEDs fabricated by laser direct writing lithography

被引:39
作者
Yu, Luming [1 ]
Lu, Boyang [1 ]
Yu, Ping [2 ]
Wang, Yang [2 ]
Ding, Guojian [2 ]
Feng, Qi [2 ]
Jiang, Yang [3 ]
Chen, Hong [2 ,3 ]
Huang, Kai [4 ]
Hao, Zhibiao [1 ,5 ]
Yu, Jiadong [1 ,5 ]
Luo, Yi [1 ,5 ]
Sun, Changzheng [1 ,5 ]
Xiong, Bing [1 ,5 ]
Han, Yanjun [1 ,5 ]
Wang, Jian [1 ,5 ]
Li, Hongtao [1 ,5 ]
Wang, Lai [1 ,5 ]
机构
[1] Tsinghua Univ, Beijing Natl Res Ctr Informat Sci & Technol, Dept Elect Engn, Beijing 100084, Peoples R China
[2] Songshan Lake Mat Lab, Dongguan 523808, Guangdong, Peoples R China
[3] Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Beijing Key Lab New Energy Mat & Devices, Key Lab Renewable Energy,Inst Phys, Beijing 100190, Peoples R China
[4] Guangdong OPPO Mobile Telecommun Corp Ltd, Dongguan 523846, Peoples R China
[5] Tsinghua Univ, Ctr Flexible Elect Technol, Beijing 100084, Peoples R China
基金
中国国家自然科学基金; 中国博士后科学基金;
关键词
701.1 Electricity: Basic Concepts and Phenomena - 712.1 Semiconducting Materials - 714.2 Semiconductor Devices and Integrated Circuits - 913.1 Production Engineering;
D O I
10.1063/5.0099642
中图分类号
O59 [应用物理学];
学科分类号
摘要
Ultra-small micro-LEDs are essential for next-generation display technology. However, micro-LEDs below 5 mu m have been seldom reported. In this work, we demonstrate InGaN-based blue and green micro-LEDs from 1 to 20 mu m by using laser direct writing lithography. The 1-mu m blue micro-LEDs show a peak external quantum efficiency of 13.02%, which is 9.57% for green ones. By characterizing the size-dependent external quantum efficiency and simply assuming that this variety is dominantly determined by the dry-etching induced dead zone, we deduce that the dead zone sizes of carrier injection at the edge of chips are 0.18 and 0.15 mu m in blue and green ones, respectively. A time-resolved photoluminescence measurement also shows that carrier lifetime reduction at the edge of blue ones is more serious than that of green ones, reflecting the easier carrier lateral diffusion in the former than the latter. These results exhibit the ability of laser direct writing lithography on micro-LED fabrication and also provide a reference for predicting the limit of their chip size scaling-down. Published under an exclusive license by AIP Publishing.
引用
收藏
页数:6
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