CHARACTERISATION OF TUNGSTEN NITRIDE LAYERS AND THEIR EROSION UNDER PLASMA EXPOSURE IN NANO-PSI

被引：0

作者：

Alegre, D. ^{[1
]}

Acsente, T. ^{[2
]}

Martin-Rojo, A. B. ^{[1
]}

Oyarzabal, E. ^{[1
,3
]}

Tabares, F. L. ^{[1
]}

Dinescu, G. ^{[2
]}

De Temmerman, G. ^{[4
]}

Birjega, R. ^{[2
]}

Logofatu, C. ^{[5
]}

Kovac, J. ^{[6
]}

Mozetic, M. ^{[6
]}

机构：

[1] EURATOM, CIEMAT, Madrid 28040, Spain

[2] Natl Inst Laser Plasma & Radiat Phys, Magurele, Romania

[3] UNED, Madrid 28040, Spain

[4] Dutch Inst Fundamental Energy Res, FOM Inst DIFFER, NL-3430 BE Nieuwegein, Netherlands

[5] Natl Inst Mat Phys, Magurele, Romania

[6] Jozef Stefan Inst, Ljubljana 1000, Slovenia

来源：

ROMANIAN REPORTS IN PHYSICS | 2015年 / 67卷 / 02期

关键词：

Tungsten nitride; tungsten; nitrogen; erosion; RF-magnetron sputtering; ITER; multilayer characterization; linear plasma device; NANO-PSI; WNX;

D O I：

暂无

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The properties of tungsten nitride thin films deposited by both reactive RF-magnetron sputtering from tungsten targets in Argon/N-2, and RF generated nitrogen ions bombardment of previously sequentially deposited tungsten layers have been investigated. Films exhibited smaller erosion than pure tungsten in Argon plasmas at NANO-PSI expanding thermal plasma device.

引用

页码：532 / 546

页数：15

共 27 条

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