CHARACTERISATION OF TUNGSTEN NITRIDE LAYERS AND THEIR EROSION UNDER PLASMA EXPOSURE IN NANO-PSI

被引：0
作者：
Alegre, D. [1 ]
Acsente, T. [2 ]
Martin-Rojo, A. B. [1 ]
Oyarzabal, E. [1 ,3 ]
Tabares, F. L. [1 ]
Dinescu, G. [2 ]
De Temmerman, G. [4 ]
Birjega, R. [2 ]
Logofatu, C. [5 ]
Kovac, J. [6 ]
Mozetic, M. [6 ]
机构：
[1] EURATOM, CIEMAT, Madrid 28040, Spain
[2] Natl Inst Laser Plasma & Radiat Phys, Magurele, Romania
[3] UNED, Madrid 28040, Spain
[4] Dutch Inst Fundamental Energy Res, FOM Inst DIFFER, NL-3430 BE Nieuwegein, Netherlands
[5] Natl Inst Mat Phys, Magurele, Romania
[6] Jozef Stefan Inst, Ljubljana 1000, Slovenia
来源：
ROMANIAN REPORTS IN PHYSICS | 2015年 / 67卷 / 02期
关键词：
Tungsten nitride; tungsten; nitrogen; erosion; RF-magnetron sputtering; ITER; multilayer characterization; linear plasma device; NANO-PSI; WNX;
D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
The properties of tungsten nitride thin films deposited by both reactive RF-magnetron sputtering from tungsten targets in Argon/N-2, and RF generated nitrogen ions bombardment of previously sequentially deposited tungsten layers have been investigated. Films exhibited smaller erosion than pure tungsten in Argon plasmas at NANO-PSI expanding thermal plasma device.
引用
收藏
页码：532 / 546
页数：15
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