Present Status and Prospect of Graphene Interconnect Applications

被引:0
|
作者
Ueno, Kazuyoshi [1 ]
机构
[1] Shibaura Inst Technol, Tokyo 1358548, Japan
基金
日本学术振兴会; 日本科学技术振兴机构;
关键词
graphene; direct deposition; intercalation; multilevel intercon; nect; inductor; antenna; transparent electrode; STABILITY;
D O I
10.1587/transele.2021FUP0008
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Graphene has been expected as an alternative material for copper interconnects in which resistance increases and reliability deterio-rates in nanoscale. While the principle advantages are verified by simu-lations and experiments, they have not been put into practical use due to the immaturity of the manufacturing process leading to mass production. On the other hand, recent steady progress in the fabrication process has in-creased the possibility of practical application. In this paper, I will review the recent advances and the latest prospects for conductor applications of graphene centered on interconnects. The possibility of further application utilizing the unique characteristics of graphene is discussed.
引用
收藏
页码:572 / 577
页数:6
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