Morphology of growth by random walk deposition

被引:6
作者
Cordeiro, JA
Lima, MVBT
Dias, RM
Oliveira, FA
机构
[1] Univ Brasilia, Dept Fis, Int Ctr Condensed Matter Phys, BR-70919970 Brasilia, DF, Brazil
[2] Univ Brasilia, Inst Phys, BR-70919970 Brasilia, DF, Brazil
来源
PHYSICA A | 2001年 / 295卷 / 1-2期
关键词
growth; deposition; random walks;
D O I
10.1016/S0378-4371(01)00075-9
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We simulate a deposition model with a break of symmetry induced by a point source. We find that Tsallis anomalous distribution for random walks n(x) = N(A)/[1 + b(q - 1)x(2)](q/(q - 1)) produces a good fit to the data. We obtain the mean square displacement <x(2)> and the total number of deposited particles nr, and compare them to the Gaussian case. Our main conclusions are twofold: first, the parameter q is size dependent; second, long range correlations imply in a violation of the law of great numbers. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:209 / 214
页数:6
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