Wet-etch texturing of ZnO:Ga back layer on superstrate-type microcrystalline silicon solar cells

被引:5
作者
Lai, Kuang-Chieh [1 ]
Tsai, Fu-Ji [2 ]
Wang, Jen-Hung [2 ]
Yeh, Chih-Hung [2 ]
Houng, Mau-Phon [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Inst Microelect, Tainan 701, Taiwan
[2] NexPower Technol Corp, Taichung 421, Taiwan
关键词
Transparent conductive oxide; Surface plasmon; Microcrystalline silicon; Thin film solar cells; SURFACE REFLECTORS; WHITE PAINT; AL FILMS; GRATINGS;
D O I
10.1016/j.solmat.2011.02.011
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Surface wet etching is applied to the ZnO:Ga (GZO) back contact in mu c-Si thin film solar cells. GZO transparency increases with increasing deposition substrate temperature. Texturing enhances reflective scattering, with etching around 5-6 s producing the best scattering, whereas etching around 5 s produces the best fabricated solar cells. Etching beyond these times produces suboptimal performance related to excessive erosion of the GZO. The best mu c-Si solar cell achieves FF=68%, V(OC)=471 mV and J(SC)=21.48 mA/cm(2) (eta=6.88%). Improvement is attributed to enhanced texture-induced scattering of light reflected back into the solar cell, increasing the efficiency of our lab-made single mu c-Si solar cells from 6.54% to 6.88%. Improved external quantum efficiency is seen primarily in the longer wavelengths, i.e. 600-1100 nm. However, variation of the fabrication conditions offers opportunity for significant tuning of the optical absorption spectrum. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:1583 / 1586
页数:4
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